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CVD Silicon Carbide
CVD (Chemical Vapour Deposition) Silicon Carbide is manufactured in two forms, Ultra-pure and Low Resistivity. Both types are very durable and withstand extremely hostile conditions.
CVD Silicon Carbide can be used in very thin, lightweight sections to improve processing performance. It has an excellent combination of properties for use in wafer processing, heating elements and chamber linings for clean environments.
Morgan Technical Ceramics innovative development techniques have made possible these stiff, durable, stable materials. Our expertise with the chemical vapour deposition process provides you with an ultra-pure end product which will increase performance and component life.
Typical CVD Silicon Carbide characteristics include:
- Ultra-pure 99.9995%
- Unparalleled wear and corrosion resistance
- Outstanding thermal conductivity
- Thermal shock resistant
- Low Thermal Expansion
- Dimensional stability
- Excellent stiffness to weight ratios
- Fine grained microstructure
- Non-porous
- High Density
- Mirror-like surface finishes
- Electrical Resistivity of 0.012 ohm cm (Low resistivity Performance SiC)
Typical CVD Silicon Carbide applications include:
- Ideal for processing chambers, gas distribution plates, edge rings and electrostatic chucks
- Heating elements and susceptors
- Chambers or liners with improved in situ clean uniformities
- Sputter targets, and all types of electrodes
